Properties of Carbon Nanowalls Grown on Glass Substrates According to the Etching Microwave Power

초록

In this paper, we investigated the effect of microwave power, during the plasma-etching of grown carbon nanowalls (CNWs), on the properties of the CNWs. A microwave plasma enhanced chemical vapor deposition (PECVD) system was used to grow CNWs on a glass substrate using a mixture of CH4 and H-2 gases. The grown CNWs were plasma-treated under the oxygen ambient (O-2) with different degrees of microwave power (500 similar to 1000 W, in steps of 100 W). After the post-plasma treatment, the cross-sectional and planar images of the CNWs were examined via field-emission scanning electron microscopy (FE-SEM) according to the microwave power of the plasma treatment. Then the structural characteristics of the CNWs were analyzed via Raman spectroscopy, and the changes in the light transmittance according to the degrees of the O-2 plasma treatment power were analyzed using UV-visible spectroscopy.

키워드