Tribological properties of Metal doped a-C film by RF magnetron sputtering method

초록

Carbon-based thin film has been studied in various fields because this film has high hardness, low wear rate, low friction coefficient, lubrication performance, electrical resistance, chemical inertness, and optical transparency. In this study, we deposited the metal doped amorphous carbon(a-C) film on silicon substrate by radio frequency(RF) magnetron co-sputtering method. Tungsten(W), molybdenum(Mo), Chromium(Cr), and nickel(Ni) were used as the doping metal of a-C film. Carbon and metal components were deposited simultancously on the silicon substrate by co-sputtering method. The applied power on the carbon and metal(W, Mo, Cr and Ni) target were 150 W and 40 W, respectively. The properties of metal doped a-C films were investigated by using scanning electron microscope.