Structural and Optical Properties of TiON Films Synthesized by a RF Magnetron Co-sputtering Method

초록

In this study we prepared TiON films by a RF magnetron co-sputtering system. TiO2 and TiN targets were used to synthesis TiON film by a co-sputtering method. We have changed deposition power of TiO2 and TiN targets to vary the ratio of oxygen and nitrogen contents in the TiON film. FE-SEM (field emission-scanning electron microscope) showed the thickness and the surface condition of the TiON films. EDS (energy dispersive spectroscope) and SIMS (secondary ion mass spectroscope) analysis showed the contents variation and the UV-visible spectroscope showed transmittance and reflectance of the film. Hardness and adhesion were measured. AFM (atomic force microscope) and FFM (friction force microscope) measurement showed the surface condition and frictional properties of the films.